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EQUIPMENT

  • Substrate Cleaning and Wet Processing Station in Class 100 Cleanroom
  • Mask Aligner  (Karl Suss MA6/BA6)
  • Mask Aligner  (Karl Suss MJB3)
  • Optical Microscope (Nikon Optiphot-300)
  • Stylus Profilomerer
  • Single Wavelength Microspot Ellipsometer (Rudolpj Focus FE III)
    • Operating Your FOCUS™ Ellipsometer System Tutorial (pdf)
    • Operating Procedure High Performance Ellipsometer FE III (pdf)
    • System Specifications FOCUS™ FE III (pdf)
  • Atomic Force Microscope (thermomicroscopes AutoProbe CP)
  • Field Emission Scanning Electron Microscope (Hitachi S-4100)
  • E-Beam Lithography using FESEM (Hitachi S-4100)
  • Inverted Optical Microscope ( Nikon TE 200)
  • Veeco Metallization Chamber
  • Oxygen Plasma System
  • CV and IV Measurement Station

 

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