EQUIPMENT

• Substrate Cleaning and Wet Processing Station in Class 100 Cleanroom
• Mask Aligner  (Karl Suss MA6/BA6)
• Mask Aligner  (Karl Suss MJB3)
• Optical Microscope (Nikon Optiphot-300)
• Stylus Profilomerer
• Single Wavelength Microspot Ellipsometer (Rudolpj Focus FE III)
  • Operating Your FOCUS™ Ellipsometer System Tutorial (pdf)
  • Operating Procedure High Performance Ellipsometer FE III (pdf)
  • System Specifications FOCUS™ FE III (pdf)
    
• Atomic Force Microscope (thermomicroscopes AutoProbe CP)
• Field Emission Scanning Electron Microscope (Hitachi S-4100)
• E-Beam Lithography using FESEM (Hitachi S-4100)
• Inverted Optical Microscope ( Nikon TE 200)
• Veeco Metallization Chamber
• Oxygen Plasma System
• CV and IV Measurement Station